Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1997-02-13
2000-10-24
Duda, Kathleen
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430327, 134 13, G03F 700
Patent
active
061365106
ABSTRACT:
The accuracy of photolithographic processing, particularly in forming small diameter through holes and/or trenches in a dielectric layer, is improved by double-sided scrubbing the wafer prior to photolithography. It was found that particles adhering to the wafer backside resulting from prior processing steps cause inaccurate photolithographic processing, particularly at a submicron level. Double-sided wafer scrubbing removes such adhering particles, thereby improving photolithographic accuracy.
REFERENCES:
patent: 3911562 (1975-10-01), Youmans
patent: 4944836 (1990-07-01), Beyer et al.
patent: 5093279 (1992-03-01), Andreshak et al.
patent: 5245794 (1993-09-01), Salugsugan
patent: 5262354 (1993-11-01), Cote et al.
patent: 5442828 (1995-08-01), Lutz
patent: 5675856 (1997-10-01), Itzkowitz
patent: 5711818 (1998-01-01), Jain
patent: 5729856 (1998-03-01), Jang
Joshi, "A New Damascene Structure for Submicrometer Interconnect Wiring," IEEE Electron Letters, vol. 14, No. 3, Mar. 1993, pp. 129-132.
Kaanta et al., "Dual Damascene: A ULSI Wiring Technology," Jun. 11-12, 1991, VMIC Conference, IEEE, pp. 144-152.
Kenney et al., "A Buried-Plate Trench Cell for a 64-Mb DRAM," 1992 Symposium on VLSI Technology Digest of Technical Papers, IEEE, pp. 14-15.
Early Kathleen Regina
La Tho Le
Ramsbey Mark T.
Thomas Jack F.
Venkatkrishnan Subramanian N.
Advanced Micro Devices , Inc.
Duda Kathleen
LandOfFree
Doubled-sided wafer scrubbing for improved photolithography does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Doubled-sided wafer scrubbing for improved photolithography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Doubled-sided wafer scrubbing for improved photolithography will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1961938