Double-walled mircrowave plasma based applicator

Details Double-walled mircrowave plasma based applicator Double-walled mircrowave plasma based applicator

1996-02-14

1998-05-05

O'Shea, Sandra L.

Electric lamp and discharge devices

Fluent material supply or flow directing means

Plasma

31323151, 31323161, 31511121, H01J 1726, H01J 6128, H01J 724, H05B 3126

Patent

active

057479178

ABSTRACT:
An improved plasma applicator uses a double-walled sapphire sleeve assembly to provide a high efficiency cooling mechanism that is adapted for use with high power applications and aggressive plasma chemistries in the generation of a plasma. Plasma contained within a highly thermally emissive first sapphire member heats the member, causing it to radiate thermal energy. The radiated thermal energy crosses a narrow gap and passes through an infrared-transparent second sapphire member. An infrared-absorbing coolant fluid that exhibits negligible microwave absorption is flowed in a second gap between the second sapphire member and a third member and absorbs most of the infrared radiation over the fluid's bulk. The use of a bulk fluid optimizes the cooling of the plasma to reduce ion and electron density and maximize reactive species output from the applicator to a vacuum process chamber.

REFERENCES:
patent: 5126635 (1992-06-01), Doehler et al.

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