Double-sided substrate cleaning apparatus and cleaning method us

Details Double-sided substrate cleaning apparatus and cleaning method us Double-sided substrate cleaning apparatus and cleaning method us

1997-07-10

1999-10-12

Warden, Jill

Cleaning and liquid contact with solids

Processes

Using solid work treating agents

134 18, 134 26, 134 32, 134902, 15 77, B08B 700, B08B 704

Patent

active

059649542

ABSTRACT:
There is provided a double-sided substrate cleaning apparatus including a carrier station for loading/unloading a carrier in which objects to be processed are stored, a convey mechanism for conveying an object taken out from the carrier station, at least one cleaning mechanism, arranged along a convey path on which the convey mechanism conveys the object, for cleaning the object, and an object reversing mechanism, arranged along the convey path, for reversing the object.

REFERENCES:
patent: 3218082 (1965-11-01), Taylor et al.
patent: 4479281 (1984-10-01), Mikutowski
patent: 5282289 (1994-02-01), Hasegawa et al.
patent: 5375291 (1994-12-01), Tateyama et al.
patent: 5498294 (1996-03-01), Matsushita et al.
Eitoku, Post-CMP Cleaning Technology, Semicon Korea 95, pp. 29-36, Jan. 1995.

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