Combustion – Process of combustion or burner operation – Burning waste gas – e.g. – furnace gas – etc.
Patent
1998-10-05
1999-12-28
Rosasco, S.
Combustion
Process of combustion or burner operation
Burning waste gas, e.g., furnace gas, etc.
430394, G03F 900
Patent
active
060073241
ABSTRACT:
A method of forming a rim type attenuating phase shifting mask which requires only one resist layer and developing the resist using a single developing solution. A transparent mask substrate has a layer of attenuating phase shifting material, a layer of opaque material, and a layer of resist material formed thereon. The layer of resist is exposed to a first pattern using a first exposure dose and a second pattern using a smaller second exposure dose. The resist is developed for a first time forming the first pattern in the entire layer of resist and the second pattern in the top portion of the layer of resist. The first pattern is then etched in the layer of opaque material using the first pattern in the layer of resist as a mask. In one embodiment the first pattern is then etched in the layer of attenuating phase shifting material, the resist is partially etched using an O.sub.2 plasma etch leaving the second pattern in the lower part of the resist, the second pattern is etched in the layer of opaque material, and the resist is stripped. In a second embodiment the layer of resist is developed for a second time in the same solution forming the second pattern in the entire resist layer, the first pattern is etched in the layer of attenuating phase shifting material, the second pattern is etched in the layer of opaque material, and the resist is stripped.
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Lin Ching-Chia
Lin Shy-Jay
Tzu San-De
Ackerman Stephen B.
Prescott Larry J.
Rosasco S.
Saile George O.
Taiwan Semiconductor Manufacturing Company , Ltd.
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