Double grid substrate plate trench

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

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257305, 257549, H01L 2978, H01L 2702, H01L 2704

Patent

active

053844742

ABSTRACT:
A high density substrate plate trench DRAM cell memory device and process are described in which a buried region is formed adjacent to deep trench capacitors such that the substrate region of DRAM transfer FETs can be electrically isolated from other FETs on a semiconductor substrate. The buried region is contacted along its perimeter by a reach through region to complete the isolation. The combined regions reduce charge loss due to better control of device parasitics.

REFERENCES:
patent: 4688063 (1987-08-01), Lu et al.
patent: 4794434 (1988-12-01), Pelley
patent: 4801988 (1989-01-01), Kenney
patent: 4829017 (1989-05-01), Malhi
patent: 4855952 (1989-08-01), Kiyosumi
patent: 4873560 (1989-10-01), Sunami et al.
patent: 4912054 (1990-03-01), Tomassetti
patent: 4918502 (1990-04-01), Kaga et al.
patent: 4920389 (1990-04-01), Itoh
patent: 4944682 (1990-07-01), Cronin et al.
patent: 5250829 (1993-10-01), Bronner et al.
patent: 5264716 (1993-11-01), Kenney
"Trench and Compact Structures for DRAMs" by P. Chatterjee et al, International Electron Devices Meeting 1986, Technical Digest paper 6.1, pp. 128-131.
"CMOS Semiconductor Memory Structural Modification to Allow Increased Memory Charge" Anonymous, IBM Technical Disclosure Bulletin, vol. 31, No. 11, Apr. 1989, pp. 162-165.
"A 45-ns 16Mb DRAM with Triple-Well Structure" by S. Fujii et al, IEEE Journal of Solid-State Circuits, vol. 24, No. 5, Oct. 1989, pp. 1170-1175.
"New Well Structure for Deep Sub-micron CMOS/BiCMOS Using Thin Epitaxy over Buried Layer and Trench Isolation" by Y. Okazaki et al, 1990 Symposium on VLSI Technology, Digest of Technical Papers, paper 6C-4, pp. 83-84.

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