Double-gate transistor with enhanced carrier mobility

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having schottky gate

Reexamination Certificate

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C438S285000, C438S173000, C257S190000, C257S201000, C257S192000

Reexamination Certificate

active

06974733

ABSTRACT:
There is disclosed an apparatus including a straining substrate, a device over the substrate including a channel, wherein the straining substrate strains the device in a direction substantially perpendicular to a direction of current flow in the channel.

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