Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Post imaging radiant energy exposure
Patent
1989-07-26
1990-11-20
McCamish, Marion C.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Post imaging radiant energy exposure
430270, 430394, 430325, 430396, 430326, 430 5, 522902, 522915, G03F 100, G03C 500
Patent
active
049718959
ABSTRACT:
A photopolymer layer is used as a radiation transparent phototool replacing a light blocking phototool in the photographic process of producing solder mask layers on printed wiring boards. Various simplification and energy reducing steps are introduced with off-contact photoprinting of patterns on liquid photopolymers having special characteristics that permit the polymerization of patterned outer skin areas partly through the thickness thereof with a controlled amount of radiation energy. This creates an in-situ surrogate phototool that permits further polymerization throughout the thickness of the layer with controlled quantities of unpatterned radiation energy. Photodiscrimination is provided by changes of photosensitivity in the layer transparent to radiation rather than by opaque imaging. Thus a first low energy photoflash through an off-contact phototool with uncollimated radiation creates on a liquid photopolymer surface two contrasting patterned areas of liquid polymer and polymerized skin. This can be achieved in an inert gas atmosphere. The second curing step in the presence of an inhibiting gas such as air with controlled radiation energy then fully cures through the thickness of the layer those skin covered portions without curing the liquid surfaced areas.
REFERENCES:
patent: 3591378 (1971-07-01), Altman
patent: 3888672 (1975-06-01), Lee
patent: 4148934 (1979-04-01), Baker
patent: 4260675 (1981-04-01), Sullivan
patent: 4291116 (1981-09-01), Tibbetts
patent: 4291118 (1981-09-01), Boduch et al.
patent: 4411931 (1984-10-01), Duong
patent: 4424089 (1984-01-01), Sullivan
patent: 4436806 (1984-03-01), Rendulic
patent: 4528261 (1985-07-01), Hauser
patent: 4618567 (1986-10-01), Sullivan
patent: 4657839 (1987-04-01), Sullivan
patent: 4666824 (1987-05-01), Messer
patent: 4732844 (1988-03-01), Ota et al.
patent: 4764452 (1988-08-01), Ohno
IBM Technical Disclosure Bulletin; vol. 14, No. 9; Feb. 1972.
Photoresist Materials and Process, McGraw-Hill, 1975, p. 121.
Brown Laurence R.
McCamish Marion C.
Rodee Christopher D.
LandOfFree
Double exposure method of photoprinting with liquid photopolymer does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Double exposure method of photoprinting with liquid photopolymer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Double exposure method of photoprinting with liquid photopolymer will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-453998