Double deflection system for an electron beam device

Electric lamp and discharge devices: systems – Cathode ray tube circuits – Cathode-ray deflections circuits

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250396R, H01J 2956

Patent

active

041018133

ABSTRACT:
A double deflection scanning system for electron beam instruments is provided embodying a means of correcting isotropic coma, and anisotropic coma aberrations induced by the magnetic lens of such an instrument. The scanning system deflects the beam prior to entry into the magnetic lens from the normal on-axis intersection of the beam with the lens according to predetermined formulas and thereby reduces the aberrations.

REFERENCES:
patent: 3753034 (1973-08-01), Spicer
patent: 3911321 (1975-10-01), Wardly

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