Dot-etchable photopolymerizable elements

Details Dot-etchable photopolymerizable elements Dot-etchable photopolymerizable elements

1979-05-10

1980-10-21

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430273, 430281, 430285, 430950, 430910, G03C 168

Patent

active

042295173

ABSTRACT:
High contrast, dot-etchable solvent-processable lithographic film elements are described comprising a sheet support, a photopolymerizable layer having a thickness of, at most, 0.0004 inch (0.010 mm) and an optical density of at least 3.0 in the actinic region. Images made from these elements may be reduced in area by a process of chemically undercutting the image areas and then spraying or rubbing them. The elements are useful as contact speed lithographic films and for other graphic arts applications.

REFERENCES:
patent: 3617278 (1971-11-01), Jeffers
patent: 3787211 (1974-01-01), Volkert et al.
patent: 3867153 (1975-03-01), Maclachan
patent: 3885963 (1975-05-01), Monaham
patent: 3887450 (1975-06-01), Gilano et al.
patent: 3901902 (1975-09-01), Kleeberg et al.
patent: 3915824 (1975-10-01), McGinnis
patent: 4002478 (1977-01-01), Kokawa et al.
patent: 4038078 (1977-07-01), Sakurai et al.
Dunham et al., Def. Pub., T900009, Published 7/18/72, pp. 1-6.

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