Doped nanoparticle-based semiconductor junction

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Fluid growth from liquid combined with subsequent diverse...

Reexamination Certificate

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C438S492000, C438S499000, C977S892000, C117S056000, C257SE21120, C257SE21133

Reexamination Certificate

active

07605062

ABSTRACT:
A doped semiconductor junction for use in an electronic device and a method for making such junction is disclosed. The junction includes a first polycrystalline semiconductor layer doped with donors or acceptors over a substrate such that the first doped semiconductor layer has a first polarity, the first layer including fused semiconductor nanoparticles; and a second layer in contact with the first semiconductor layer over a substrate to form the semiconductor junction.

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