Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2006-06-20
2006-06-20
Prenty, Mark V. (Department: 2822)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S343000, C257S655000
Reexamination Certificate
active
07064385
ABSTRACT:
A DMOS-transistor has a trench bordered by a drift region including two doped wall regions and a doped floor region extending along the walls and the floor of the trench. The laterally extending floor region has a dopant concentration gradient in the lateral direction. For example, the floor region includes at least two differently-doped floor portions successively in the lateral direction. This dopant gradient in the floor region is formed by carrying out at least one dopant implantation from above through the trench using at least one mask to expose a first area while covering a second area of the floor region.
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Dudek Volker
Graf Michael
Atmel Germany GmbH
Fasse W. F.
Fasse W. G.
Prenty Mark V.
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