Divisionally exposing an active area in LCD with a plurality...

Details Divisionally exposing an active area in LCD with a plurality... Divisionally exposing an active area in LCD with a plurality...

2006-11-28

2006-11-28

Schechter, Andrew (Department: 2871)

Liquid crystal cells, elements and systems

Nominal manufacturing methods or post manufacturing...

C430S005000, C430S312000, C430S314000

Reexamination Certificate

active

07142279

ABSTRACT:
In a method of manufacturing a liquid crystal display using a divisional exposure for a substrate, an overlapping area at the boundary between adjacent shots is provided and the shots left and right to the boundary are exposed in a way that the areas of the shots gradually decreases and gradually increases, respectively, to reduce the brightness difference due to stitch errors between the two shots. For example, the number of unit stitch areas assigned to the left gradually decreases and the number of unit stitch areas assigned to the right shot gradually increases as it goes to the right along the transverse direction in the stitch area. A unit stitch includes an area obtained by dividing a pixel into at least two parts.

REFERENCES:
patent: 5656526 (1997-08-01), Inada et al.
patent: 5945256 (1999-08-01), Kim et al.
patent: 5953093 (1999-09-01), Hirata et al.
patent: 6147722 (2000-11-01), Shimada et al.
patent: 6784949 (2004-08-01), Nagata et al.
patent: 2000-0010252 (2000-02-01), None
patent: WO 02/42840 (2002-05-01), None
PCT International Search Report; International application No. PCT/KR02/01764; International filing date: Sep. 18, 2002; Date of Mailing: Feb. 27, 2003.

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