Disturbance-free, recipe-controlled plasma processing system...

Details Disturbance-free, recipe-controlled plasma processing system... Disturbance-free, recipe-controlled plasma processing system...

2006-02-03

2009-10-13

Kackar, Ram N. (Department: 1792)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With measuring, sensing, detection or process control means

C156S345250, C156S345280, C118S712000

Reexamination Certificate

active

07601240

ABSTRACT:
A plasma processing system includes a first unit for plasma-processing a sample based on a recipe for plasma processing, and a second unit for modifying the recipe in accordance with a monitored value obtained during the plasma processing of the sample in the first unit. A next sample is plasma processed in the first unit based on the modified recipe.

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