Distribution of energy in a high frequency resonating wafer...

Cleaning and liquid contact with solids – Apparatus – With movable means to cause fluid motion

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C134S137000, C134S147000, C134S902000, C310S367000, C367S140000, C367S141000, C367S153000, C367S154000, C367S155000, C367S157000, C367S166000

Reexamination Certificate

active

10371679

ABSTRACT:
A transducer for use in an acoustic energy cleaner is provided. The transducer includes a resonator and a plurality of crystals bonded to a surface of the resonator. The plurality of crystals is configured to be bonded to the surface of the resonator in a staggered arrangement with respect to each other. In one embodiment, the plurality of crystals is bonded to the surface of the resonator in a horizontally staggered arrangement. In another embodiment, the plurality of crystals is bonded to the surface of the resonator in a vertically staggered arrangement.

REFERENCES:
patent: 2406792 (1946-09-01), Benioff
patent: 2466112 (1949-04-01), Keller
patent: 2484626 (1949-10-01), Keller
patent: 2497680 (1950-02-01), Massa
patent: 3371233 (1968-02-01), Cook
patent: 3470394 (1969-09-01), Whatley, Jr. et al.
patent: 3788721 (1974-01-01), Vause
patent: 4118649 (1978-10-01), Shwartzman et al.
patent: 4270105 (1981-05-01), Parker et al.
patent: 4692654 (1987-09-01), Umemura et al.
patent: 4736759 (1988-04-01), Coberly et al.
patent: 4909266 (1990-03-01), Massa
patent: 5260913 (1993-11-01), Kadota et al.
patent: 5316591 (1994-05-01), Chao et al.
patent: 5370740 (1994-12-01), Chao et al.
patent: 5377705 (1995-01-01), Smith et al.
patent: 5446330 (1995-08-01), Eda et al.
patent: 5456759 (1995-10-01), Stanford et al.
patent: 5522938 (1996-06-01), O'Brien
patent: 5698040 (1997-12-01), Guldi et al.
patent: 6671380 (2003-12-01), Chang et al.
patent: 6711792 (2004-03-01), Itasaka
patent: 6713389 (2004-03-01), Speakman
patent: 6726848 (2004-04-01), Hansen et al.
patent: 6840250 (2005-01-01), Kashkoush et al.
patent: 6870306 (2005-03-01), Ajioka
patent: 6880560 (2005-04-01), Ching et al.
patent: 6954021 (2005-10-01), Gouk et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Distribution of energy in a high frequency resonating wafer... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Distribution of energy in a high frequency resonating wafer..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Distribution of energy in a high frequency resonating wafer... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3776845

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.