Distribution manifold for exhausting photoresist vapors

Details Distribution manifold for exhausting photoresist vapors Distribution manifold for exhausting photoresist vapors

2005-08-09

2005-08-09

Fuqua, Shawntina (Department: 3742)

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

C219S405000, C219S411000, C392S416000, C392S418000, C118S724000, C118S725000, C118S050100

Reexamination Certificate

active

06927363

ABSTRACT:
An exhaust apparatus for evacuating vapor during baking of liquid chemicals deposited on substrates including a heating chamber containing a hot plate for horizontally supporting and heating a substrate. A cover plate is suspended horizontally over the hot plate; the cover plate has a plurality of exhaust ports extending from the top to its bottom surfaces. The ports are radially and evenly disposed midway between the periphery and a centered port with a manifold mounted to the top of the cover plate. The manifold has tubular conduits connected underneath to each exhaust port. Each conduit has an adjustable damper disposed at its front opening for regulating the vapor being exhausted. The tubular conduits converge from each exhaust port towards a common enclosure with an exhaust pipe coupled to its top for exhausting vapor to an external recovery facility.

REFERENCES:
patent: 6185370 (2001-02-01), Sekimoto et al.
patent: 6228171 (2001-05-01), Shirakawa
patent: 6229116 (2001-05-01), Shirakawa et al.
patent: 6291800 (2001-09-01), Shirakawa et al.
patent: 6419751 (2002-07-01), Nagashima

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