Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2004-02-20
2008-09-09
Walke, Amanda C. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C526S280000, C526S281000
Reexamination Certificate
active
07422836
ABSTRACT:
Oligomers of polycyclic olefin monomers, and optionally allylic or olefinic monomers, and a method of making such oligomers that includes reacting polycyclic olefin monomers in the presence of a Ni or Pd containing catalyst, or in the case of allylic monomers in the presence of a free radical initiator. The oligomers can be included in photoresist compositions as dissolution rate modifiers. The photoresist compositions can further include a polymeric binder resin, a photoacid generator, and solvents.
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Applicant's “Exhibit C” part of paper No. Dec. 8, 2006 (was not scanned in with the rest of the response).
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Exhibit C, submitted in a Declaration Under 37 CFR by Larry Rhodes in an Amendment dated Dec. 8, 2006 in the present application.
Duff Robert J.
Goodall Brian L.
McIntosh, III Lester H.
Rhodes Larry F.
Seger Lawrence
Promerus LLC
The Webb Law Firm
Walke Amanda C.
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