Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Amorphous semiconductor material
Reexamination Certificate
2011-08-16
2011-08-16
Menz, Laura M (Department: 2813)
Active solid-state devices (e.g., transistors, solid-state diode
Non-single crystal, or recrystallized, semiconductor...
Amorphous semiconductor material
C257S762000, C257S268000
Reexamination Certificate
active
07999258
ABSTRACT:
A display substrate includes a base substrate, a first metal pattern, a second metal pattern, a first transparent conductive layer and a second transparent conductive layer. The first metal pattern is formed on the base substrate, and includes a gate line and a gate electrode connected to the gate line. The second metal pattern includes a data line crossing the gate line, a source electrode connected to the data line and a drain electrode being spaced apart from the source electrode. The first transparent conductive layer includes a capping layer capping the second metal pattern and a common electrode formed in a pixel area. The second transparent conductive layer includes a pixel electrode having a plurality of openings, contacting the capping layer capping the drain electrode, and facing the common electrode.
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Jun Sang-Hyun
Lee Jae-Bok
You Chun-Gi
Innovation Counsel LLP
Menz Laura M
Samsung Electronics Co,. Ltd.
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