Display substrate and method for manufacturing the same

Details Display substrate and method for manufacturing the same Display substrate and method for manufacturing the same

2011-01-04

2011-01-04

Trinh, Michael (Department: 2822)

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

Including integrally formed optical element

C438S149000, C438S151000

Reexamination Certificate

active

07863065

ABSTRACT:
A method of forming a display substrate includes forming an array layer on a substrate, forming a passivation layer on the array layer, forming a photoresist pattern on the passivation layer corresponding to a gate line, a source line and a thin-film transistor of the array layer, etching the passivation layer using the photoresist pattern as a mask Non-uniformly surface treating a surface of the photoresist pattern, forming a transparent electrode layer on the substrate having the surface-treated photoresist pattern formed thereon and forming a pixel electrode. The forming a pixel electrode includes removing the photoresist pattern and the transparent electrode layer, such as by infiltrating a strip solution into the surface-treated photoresist pattern.

REFERENCES:
patent: 2002/0057394 (2002-05-01), Takahashi et al.
patent: 2006/0038178 (2006-02-01), Youn
patent: 2006/0145161 (2006-07-01), Lee et al.

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