Display device, method for manufacturing thereof, and...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer

Reexamination Certificate

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C257SE21414

Reexamination Certificate

active

11042518

ABSTRACT:
The invention provides a display device and a method for manufacturing thereof by increasing a material efficiently as well as simplifying steps. Also, the invention provides a technique for forming a pattern such as a wiring, that is used for forming a display device, to have a predetermined shape with an excellent controllability. The method for manufacturing a display device includes the steps of: forming a lyophobic region; selectively irradiating laser beam in the lyophobic region to form a lyophilic region; selectively discharging a composition, that contains a conductive material, in the lyophilic region to form a gate electrode layer; forming a gate insulating layer and a semiconductor layer over the gate electrode layer; discharging a composition containing a conductive material over the semiconductor layer to form a source electrode layer and a drain electrode layer; and forming a pixel electrode layer on the source or drain electrode layer.

REFERENCES:
patent: 6225750 (2001-05-01), Kimura
patent: 6734029 (2004-05-01), Furusawa
patent: 2003/0129321 (2003-07-01), Aoki
patent: 09-260808 (1997-10-01), None
patent: 11-251259 (1999-09-01), None
patent: 2003-178872 (2003-06-01), None
patent: 2003-209339 (2003-07-01), None
patent: 2003-209340 (2003-07-01), None

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