Display device and method for manufacturing the same

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer

Reexamination Certificate

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Details

C438S487000, C438S007000, C257S070000, C257SE21530, C257SE21412

Reexamination Certificate

active

10891522

ABSTRACT:
The average film thickness of an amorphous silicon film formed on a substrate is measured. Then, the amorphous silicon film is irradiated with a laser beam to form a polysilicon film, and the grain size distribution of the polysilicon film is measured. An optimum value of energy density of laser beam irradiation is calculated on the basis of grain size values measured at two points A and B of the polysilicon film. Then, the average film thickness of an amorphous silicon film formed on a subsequent substrate is measured. A value of energy density of laser beam irradiation for the subsequent amorphous silicon film is calculated on the basis of the two average film thicknesses. Accordingly, a uniform polysilicon film of large grain sizes is formed on the whole surface of a large-size substrate to provide polysilicon TFTs in a large area.

REFERENCES:
patent: 5372836 (1994-12-01), Imahashi et al.
patent: 6059873 (2000-05-01), Yamaguchi et al.
patent: 6080236 (2000-06-01), McCulloch et al.
patent: 6218198 (2001-04-01), Imao et al.
patent: 6411906 (2002-06-01), Goto
patent: 2002/0059896 (2002-05-01), Yamaguchi et al.
patent: 2002/0066931 (2002-06-01), Tamura et al.
patent: 2002/0160586 (2002-10-01), Wada et al.
patent: 2003/0016349 (2003-01-01), Tsumura et al.
patent: 2003/0027410 (2003-02-01), Matsumura et al.
patent: 2003/0036251 (2003-02-01), Mitsuhashi et al.
patent: 2003/0064571 (2003-04-01), Takeda et al.
patent: 2004/0061149 (2004-04-01), Jyumonji et al.
patent: 2005/0199597 (2005-09-01), Tsao et al.
patent: 10-294289 (1997-04-01), None
patent: 2003-109902 (2001-10-01), None
patent: 2003-203863 (2002-01-01), None
patent: 1999-020745 (1997-08-01), None

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