Dispenser system for atomic beam assisted metal organic...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Reexamination Certificate

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C427S255394, C118S715000

Reexamination Certificate

active

07439180

ABSTRACT:
A dispenser system for use in atomic beam assisted metal organic chemical vapor deposition is provided as well as a method of depositing an ultra-thin film using the same. The inventive dispenser system includes an atomic source having an unimpeded line of site to a substrate and an annular metal organic chemical vapor deposition showerhead having a plurality of nozzles for delivering a precursor to the substrate. In accordance with the present invention, each of the nozzles present on the showerhead is angled to provide precursor beam trajectories that crossover and are non-intercepting.

REFERENCES:
patent: 5741547 (1998-04-01), Akram et al.
patent: 6596133 (2003-07-01), Moslehi et al.

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