Discharge reaction apparatus utilizing dynamic magnetic field

Details Discharge reaction apparatus utilizing dynamic magnetic field Discharge reaction apparatus utilizing dynamic magnetic field

1987-10-20

1989-05-09

Moore, David K.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

315344, 204298, C23C 1500

Patent

active

048292150

ABSTRACT:
A discharge reaction apparatus utilizing dynamic magnetic field for subjecting the surface of an object to a depositing or an etching process is disclosed. The apparatus comprises a member for generating dynamic magnetic field along the surface of an electrode and a member for limiting or forbidding the circulating motion of electron around the electrode.

REFERENCES:
patent: 3283205 (1966-11-01), DeBolt
patent: 3961103 (1976-06-01), Aisenberg
patent: 4233109 (1980-11-01), Nishizawa
patent: 4417968 (1983-11-01), McKelvey
patent: 4422916 (1983-12-01), McKelvey
patent: 4443318 (1984-04-01), McKelvey
patent: 4444643 (1984-04-01), Garrett
Patent Abstracts of Japan, unexamined applications, C field, vol. 7, No. 43, Feb. 19, 1983, The Patent Office Japanese Government, p. 70 C 152 Kokai-No. 57-194 256.
Patent Abstracts of Japan, unexamined applications, C field, vol. 3, No. 14, Feb. 8, 1979, The Patent Office Japanese Government, p. 150 C 36 Kokai-No. 53-141 182.

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