Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Reexamination Certificate
2005-04-26
2005-04-26
Vo, Tuyet Thi (Department: 2821)
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
C315S111410, C118S7230ER, C118S7230IR, C204S298220, C204S298200
Reexamination Certificate
active
06885154
ABSTRACT:
The present invention provides a magnetic neutral line plasma discharge processing system that makes it no longer necessary to use an insulator wall in the vacuum chamber and metal such as stainless steel may alternatively be used, while maintaining the features including both time/space and space controllability relative to the size and the location of low pressure, low temperature and high density plasma to be generated. Thus, the cost of the system can be reduced remarkably. As a result, the scope of application of discharge plasma systems can be broadened. A magnetic neutral line plasma discharge processing system according to the invention comprises a magnetic field generating means for generating a magnetic neutral line formed by a succession of zero magnetic field positions existing continuously in the vacuum chamber and corresponding to the shape and the size of the object of processing and an electric field generating means for generating discharge plasma in a space containing the magnetic neutral line by applying a radio frequency electric field to the magnetic neutral line generated in the vacuum chamber by said magnetic field generating means at an inclined angle, said inclined angle possibly being rectangle.
REFERENCES:
patent: 5733405 (1998-03-01), Taki et al.
patent: 6422172 (2002-07-01), Tanaka et al.
patent: 20020170678 (2002-11-01), Hayashi et al.
patent: 2705897 (1997-09-01), None
patent: 3177573 (2001-04-01), None
Kunibe Toshijyu
Uchida Taijiro
Hunt, Jr. Ross F.
Stites & Harbison PLLC
ULVAC Inc.
Vo Tuyet Thi
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