Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2008-08-18
2010-12-07
Duda, Kathleen (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S394000
Reexamination Certificate
active
07846642
ABSTRACT:
Disclosed herein is a method for generating a three-dimensional structure on a surface. The method comprises forming a layer comprising a plurality of nanoparticles on a surface; and exposing a portion of the layer to incident radiation having a defined pattern at a dosage effective to aggregate the nanoparticles in the exposed portion of the layer into a three-dimensional structure, wherein the three-dimensional structure has a shape defined by the pattern of the radiation and a height defined by the dosage of the incident radiation and a thickness of the nanoparticle layer. Alternatively, the method comprises forming a layer comprising a plurality of nanoparticles on a surface of a three-dimensional template; and exposing at least a portion of the layer to incident radiation at a dosage effective to aggregate the nanoparticles in the exposed portion of the layer into a three-dimensional structure that corresponds to the three-dimensional template.
REFERENCES:
patent: 5328534 (1994-07-01), Calhoun et al.
patent: 6309798 (2001-10-01), Reetz et al.
patent: 6664027 (2003-12-01), Griffith et al.
patent: 7344605 (2008-03-01), Ono et al.
patent: 2002/0104762 (2002-08-01), Stonas et al.
patent: 0672765 (1995-09-01), None
patent: 9218246 (1992-10-01), None
Saitoh, et al., “Manipulation of Vortex Circulation in Decentered Ferromagnetic Nanorings,” Journal of Applied Physics, vol. 95, No. 4, pp. 1985-1988 (Feb. 2004).
Ofir Yuval
Rotello Vincent Martin
Samanta Bappaditya
Tuominen Mark Thomas
Xiao Qijun
Cantor & Colburn LLP
Duda Kathleen
Sullivan Caleen O
The University of Massachusetts
LandOfFree
Direct incident beam lithography for patterning... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Direct incident beam lithography for patterning..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Direct incident beam lithography for patterning... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4171630