Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article
Patent
1998-03-02
2000-12-19
McPherson, John A.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making named article
430394, 430396, 347 47, B41J 216
Patent
active
061625892
ABSTRACT:
A process for creating and an apparatus employing shaped orifices in a semiconductor substrate. A first layer of material is applied on the semiconductor substrate then a second layer of material is then applied upon the first layer of material. An orifice image is then transferred to the first layer of material and a fluid-well image is transferred to the second layer of material. That portion of the second layer of material where the orifice image is located is then developed along with that portion of the first layer of material where the fluid well is located to define an orifice in the substrate.
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Chen Chien-Hau
Davis Colin C.
Hess Jeffery S.
Kawamura Naoto
Liu Qin
Hewlett--Packard Company
Jenski Raymond A.
McPherson John A.
Myers Timothy F.
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