Direct flow crystal growth system

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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422245, 23302R, 156624, 156DIG71, 156DIG81, 156DIG63, C30B 708

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active

051222248

ABSTRACT:
A crystal is grown in a constantly filtered solution which is flowed directly into the growing face of a crystal. In a continuous flow system, solution at its saturation temperature is removed from a crystal growth tank, heated above its saturation temperature, filtered, cooled back to its saturation temperature, and returned to the tank.

REFERENCES:
patent: 2562325 (1951-07-01), Merritt
patent: 2615797 (1952-10-01), Bruzau
patent: 3498759 (1970-03-01), Kralik
patent: 3560168 (1971-02-01), Stanton
patent: 3666410 (1972-05-01), Aoyama et al.
Pamplin Crystal Growth second edition, Pergamon Press, New York, 1980 pp. 406-407.
Loiacono et al., "Growth of KH.sub.2 PO.sub.4 Crystals at Constant Temperature and Supersaturation," Journal of Crystal Growth, vol. 62 (1983) pp. 545-556.
Bordui, "Growth of Large Single Crystals from Aqueous Solution: A Review," Journal of Crystal Growth, vol. 85 (1987) pp. 199-205.
Sasaki et al., "Influence of Bacteria in a Potassium Dihydrogen Phosphate Solution . . . ", Jap. Jour. of Applied Physics, vol. 26, No. 11, Nov. 1987, pp. L1767-L1769.

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