Dimension monitoring method and system

Details Dimension monitoring method and system Dimension monitoring method and system

2005-10-05

2008-12-02

Pham, Hoa Q (Department: 2886)

Optics: measuring and testing

Dimension

C356S630000, C430S030000, C430S005000

Reexamination Certificate

active

07460251

ABSTRACT:
A system and method are disclosed for monitoring a dimensional change of a pattern for an object having a transparent layer exposed through the pattern and a non-transparent pattern laminated therewith. According to the method, a first beam is projected to the pattern. A second beam resulted from the first beam passing through the transparent layer exposed by the pattern, or from the first beam reflected from the non-transparent layer of the pattern, is detected. A value of a predetermined property from the second beam detected is obtained. A variation of the value is monitored for identifying the dimensional change of the pattern.

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