Dimension measurement system utilizing scanning electron beam

Radiant energy – Inspection of solids or liquids by charged particles – Electron probe type

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Details

250307, 250397, G01N 2300, H01J 3728

Patent

active

051265664

ABSTRACT:
There is disclosed an electron beam metrological system which is inexpensive to fabricate but capable of accurately measuring the length of a circuit pattern formed on a wafer. The system comprises an X scan coil, a Y scan coil, an X scanning signal generator, a Y scanning generator, a detector for detecting secondary electrons emanating from a specimen when a rectangular region on the specimen is scanned by an electron beam in X and Y directions, a memory for storing the output signal from the detector, and a display unit for displaying an image of the rectangular region according to the data stored in the memory. The scanning generators are controlled by a CPU such that the scan made in the X direction is repeated plural times while the starting position of each scan is shifted in the X direction. The amount of the shift is so set that the beam hits the rectangular region at equally spaced positions. The signals stored in the memory in response to the repeated scan are used to determine the length.

REFERENCES:
patent: 4286154 (1981-08-01), Okubo et al.
patent: 4567364 (1986-01-01), Kano et al.
patent: 4600839 (1986-07-01), Ichihashi
patent: 4767926 (1988-08-01), Murakoshi et al.

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