Etching a substrate: processes – Gas phase etching of substrate – Irradiating – ion implanting – alloying – diffusing – or...
Patent
1993-10-21
1995-05-02
Powell, William
Etching a substrate: processes
Gas phase etching of substrate
Irradiating, ion implanting, alloying, diffusing, or...
216 87, 216 58, 216 83, 216 41, B44C 122, B29C 3700
Patent
active
054116287
ABSTRACT:
A non-photographic diffusion patterning method for making patterns in organic films utilizing a screen having a plurality of recessed polygon-shaped apertures.
REFERENCES:
patent: 5032216 (1991-07-01), Felten
patent: 5209814 (1993-05-01), Felten et al.
patent: 5260163 (1993-11-01), Nebe et al.
patent: 5275689 (1994-01-01), Felten et al.
E. I. Du Pont de Nemours and Company
Powell William
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