Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1999-08-17
2000-06-06
Diamond, Alan
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429813, 228115, 228116, 228164, 228165, 228174, 228203, 228194, 228195, 428650, 428655, 428687, 428615, 419 48, 419 49, C23C 1434, B23K 2000
Patent
active
060713895
ABSTRACT:
A sputter target assembly includes a cobalt target diffusion bonded to an aluminum or copper backing plate by means of a titanium interlayer. The sputter target assembly may be made by hot vacuum pressing or, preferably, by hot isostatically pressing the target, interlayer and backing plate together. Preferably, the titanium interlayer is provided as a foil, but may also be formed on a mating surface of either the target or the backing plate by electroplating, sputtering, electroless plating, or plasma spraying. The target may be advantageously machined with grooves defining salient points prior to providing the interlayer.
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Diamond Alan
Tosoh SMD, Inc.
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