Diffused drain transistor

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S335000, C257SE29268, C257SE29278

Reexamination Certificate

active

07615822

ABSTRACT:
A transistor has a source that includes a first impurity region with a first volume and a first surface area on a surface of the transistor. The transistor also has a drain that includes a second impurity region with a second volume and a second surface area on a surface of the transistor, a third impurity region with a third volume that overlaps and extends deeper than the second volume of the second impurity region, and a fourth impurity region with a fourth volume and a third surface area. The third surface area is located in the second surface area of the second impurity region. Additionally, the second and third impurity regions have a lower concentration of impurities than the fourth impurity region. The transistor also has a gate to control a depletion region between the source and the drain.

REFERENCES:
patent: 4769686 (1988-09-01), Horiuchi et al.
patent: 5053838 (1991-10-01), Fujihira
patent: 5151759 (1992-09-01), Vinal
patent: 5275961 (1994-01-01), Smayling et al.
patent: 5349225 (1994-09-01), Redwine et al.
patent: 5438220 (1995-08-01), Nakagawa et al.
patent: 5525822 (1996-06-01), Vinal
patent: 5714784 (1998-02-01), Ker et al.
patent: 5834851 (1998-11-01), Ikeda et al.
patent: 5953616 (1999-09-01), Ahn
patent: 5955746 (1999-09-01), Kim
patent: 5998274 (1999-12-01), Akram et al.
patent: 6022770 (2000-02-01), Hook et al.
patent: 6078082 (2000-06-01), Bulucea
patent: 6142375 (2000-11-01), Belka et al.
patent: 6225176 (2001-05-01), Yu
patent: 6489209 (2002-12-01), Shimoji
patent: 6518835 (2003-02-01), Riho et al.
patent: 6538288 (2003-03-01), Lee et al.
patent: 6563175 (2003-05-01), Shiau et al.
patent: 6677210 (2004-01-01), Hebert
patent: 6831332 (2004-12-01), D'Anna et al.
patent: 2001/0020731 (2001-09-01), Takamura
patent: 2002/0109184 (2002-08-01), Hower et al.
patent: 2003/0122160 (2003-07-01), Houston et al.
patent: 4-208571 (1992-07-01), None
Webster's Collegiate Dictionary, 10thEdition, Springfield, Massachusetts (1999), p. 222.
S. Wolf, “Silicon Processing in the VLSI Era”, vol. 3—The Submicron MOSFET, Lattice Press, Sunset Beach, California (1995), pp. 591-592 (section 9.6).
Wolf, SW., “Silicon Processing for the VLSI Era”, vol. 3—The submicron MOSFET, Lattice Press, Sunset Beach, California 1995 (ISBN o-961672-5-3), pp. 591-593.
S. Wolf, “Silicon Processing for the VLSI Era”, vol. 2—Process Integration, p. 662; Lattice Press, Sunset Beach, CA 90742 (ISBN: 0-961672-4-5) (1990).
Wolf, S., “Silicon Processing for the VLSI Era”, vol. 3—The submicron MOSFET, Lattice Press, Sunset Beach, CA (USA) (1995), pp. 136-137.
Wolf et al, “Silicon Processing for the VLSI Era”, vol. 1—“Process Technology”, Second Edition, Lattice Press, Sunset Beach, CA (USA) (ISBN: 0-961672-6-1) (2000), pp. 376-378 and 807-809.
Wolf, S., “Silicon Processing for the VLSI Era”, vol. 3—“The submicron MOSFET”, Lattice Press, Sunset Beach, CA (USA) (ISBN: 0-961672-5-3) (1995), pp. 586-592.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Diffused drain transistor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Diffused drain transistor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Diffused drain transistor will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4063677

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.