Diffused buried plate trench dram cell array

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

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257304, 257311, 257390, 257544, 361313, H01L 27108, H01L 2976, H01L 2900, H01G 406

Patent

active

052647161

ABSTRACT:
A high density substrate plate DRAM cell memory device is described in which a buried plate region is formed adjacent to deep trench capacitors such that the substrate region of DRAM transfer FETs can be electrically isolated from other FETs on a semiconductor substrate. The buried region is partially formed by lateral outdiffusion from the sidewalls of the deep trenches and partially formed by an N-well surface diffusion which entirely surrounds the DRAM array region.

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