Etching a substrate: processes – Forming or treating optical article
Reexamination Certificate
2005-06-14
2005-06-14
Norton, Nadine G. (Department: 1765)
Etching a substrate: processes
Forming or treating optical article
C216S026000, C216S083000, C216S095000, C216S099000
Reexamination Certificate
active
06905618
ABSTRACT:
Diffractive optical elements and methods of making the same are described. In one aspect, a diffractive optical element is made by forming a multilayer structure comprising multiple amorphous silicon phase shift layers having respective thicknesses selected so that the diffractive optical element is operable to phase shift infrared light within an operative wavelength range. The amorphous silicon phase shift layers are separated by respective silicon dioxide etch stop layers having respective thicknesses of about 5 nm or less. Layers of the multilayer structure are serially masked and etched to form a multi-step optical structure. In another aspect, a diffractive optical element is made by forming a multilayer structure comprising multiple etch layers separated by respective etch stop layers selectively etchable with respect to the etch layers. One or more of the etch and etch stop layers are substantially opaque to light within an operative wavelength range. Opaque layers are converted into substances substantially transparent to light within the operative wavelength range. Layers of the multilayer structure are serially masked and etched to form a multi-step optical structure.
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Grubbs Wayne H.
Matthews James Albert
Agilent Technologie,s Inc.
Norton Nadine G.
Tran Binh X.
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