Differential capacitive type MEMS sensor apparatus with...

Measuring and testing – Specimen stress or strain – or testing by stress or strain... – Specified electrical sensor or system

Reexamination Certificate

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Reexamination Certificate

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06862938

ABSTRACT:
Disclosed is a differential capacitive type MEMS sensor apparatus provided with a MEMS structure including a differential capacitive type MEMS sensor and a capacitance compensator having a MEMS structure. The differential capacitive type MEMS sensor apparatus includes a fixed frame unit including first and second fixed frames prepared in pairs, partially fixed to the MEMS base; a movable frame unit movably connected to the MEMS base substrate so that first capacitance is generated between the movable frame unit and the first fixed frame and second capacitance is generated between the movable frame unit and the second fixed frame; first capacitance compensating frame units serving to compensate for the first capacitance using capacitances generated between the movable frames and the movable electrodes; and second capacitance compensating frame units serving to compensate for the second capacitance using capacitances generated between the movable frames and the movable electrodes.

REFERENCES:
patent: 6078016 (2000-06-01), Yoshikawa et al.
patent: 20020194919 (2002-12-01), Lee et al.

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