Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1994-06-22
1996-11-26
Mintel, William
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257296, 257301, 257310, 257417, 257418, 257443, 423593, 365 65, 365117, 365145, 359248, 7351416, 7351421, 7351434, 7351436, H01L 27108, H01L 2976, H01L 2994, H01L 31119
Patent
active
055788459
ABSTRACT:
A dielectric thin film device is constructed by a dielectric thin film using lead erbium zirconate titanate represented by (Pb.sub.1-y Er.sub.y) (Zr.sub.x Ti.sub.1-x)O.sub.3 with 0<x<1 and 0<y<1. This dielectric thin film element has excellent electric characteristics of a leak electric current and fatigue characteristics, etc. The dielectric thin film element may have a thermally grown silicon dioxide film, a titanium film, a platinum lower electrode, a film of lead erbium zirconate titanate represented by (Pb.sub.1-y Er.sub.y) (Zr.sub.x Ti.sub.1-x)O.sub.3 and a platinum upper electrode. These films and electrodes are sequentially formed on an n-type silicon substrate. In this case, 0.45.ltoreq.x.ltoreq.0.75 and 0.05.ltoreq.y.ltoreq.0.1 are set. A method for manufacturing a dielectric thin film has the steps of coating a substrate with a precursor solution of erbium lead zirconate titanate represented by (Pb.sub.1-y Er.sub.y) (Zr.sub.x Ti.sub.1-x)O.sub.3 drying the coated solution at a high temperature to obtain a dry gel; and thermally treating the dry gel at a higher temperature to produce the dielectric thin film is constructed of the lead erbium zirconate titanate represented by (Pb.sub.1-y Er.sub.y) (Zr.sub.x Ti.sub.1-x)O.sub.3 with 0.45.ltoreq.x.ltoreq.0.8 and 0.005.ltoreq.y.ltoreq.0.1.
REFERENCES:
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Hirano et al., Third Euro-Ceramics, "Processing of Better . . . ," vol. 2, pp. 685-698, Sep. 12, 1993, Faenza Editrice Iberica, Spain.
M. N. Kamalasanan et al., "Dielectric and ferroelectric properties . . . ," J. Appl. Phys. 74(9), Nov. 1, 1993, pp. 5679-5686.
Reza Moazzami et al., IEEE Transactions on Electron Devices, vol. 39, No. 9, pp. 2044-2049 (Sep., 1992).
R. E. Jones et al., Appl. Phys. Lett. 60(8), pp. 1022-1024 (Feb. 24, 1992).
Masuda Yoshiyuki
Ogimoto Yasushi
Ootani Noboru
Mintel William
Sharp Kabushiki Kaisha
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