Dielectric thin film device with lead erbium zirconate titanate

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

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257296, 257301, 257310, 257417, 257418, 257443, 423593, 365 65, 365117, 365145, 359248, 7351416, 7351421, 7351434, 7351436, H01L 27108, H01L 2976, H01L 2994, H01L 31119

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055788459

ABSTRACT:
A dielectric thin film device is constructed by a dielectric thin film using lead erbium zirconate titanate represented by (Pb.sub.1-y Er.sub.y) (Zr.sub.x Ti.sub.1-x)O.sub.3 with 0<x<1 and 0<y<1. This dielectric thin film element has excellent electric characteristics of a leak electric current and fatigue characteristics, etc. The dielectric thin film element may have a thermally grown silicon dioxide film, a titanium film, a platinum lower electrode, a film of lead erbium zirconate titanate represented by (Pb.sub.1-y Er.sub.y) (Zr.sub.x Ti.sub.1-x)O.sub.3 and a platinum upper electrode. These films and electrodes are sequentially formed on an n-type silicon substrate. In this case, 0.45.ltoreq.x.ltoreq.0.75 and 0.05.ltoreq.y.ltoreq.0.1 are set. A method for manufacturing a dielectric thin film has the steps of coating a substrate with a precursor solution of erbium lead zirconate titanate represented by (Pb.sub.1-y Er.sub.y) (Zr.sub.x Ti.sub.1-x)O.sub.3 drying the coated solution at a high temperature to obtain a dry gel; and thermally treating the dry gel at a higher temperature to produce the dielectric thin film is constructed of the lead erbium zirconate titanate represented by (Pb.sub.1-y Er.sub.y) (Zr.sub.x Ti.sub.1-x)O.sub.3 with 0.45.ltoreq.x.ltoreq.0.8 and 0.005.ltoreq.y.ltoreq.0.1.

REFERENCES:
patent: 5112433 (1992-05-01), Dawson et al.
Hirano et al., Third Euro-Ceramics, "Processing of Better . . . ," vol. 2, pp. 685-698, Sep. 12, 1993, Faenza Editrice Iberica, Spain.
M. N. Kamalasanan et al., "Dielectric and ferroelectric properties . . . ," J. Appl. Phys. 74(9), Nov. 1, 1993, pp. 5679-5686.
Reza Moazzami et al., IEEE Transactions on Electron Devices, vol. 39, No. 9, pp. 2044-2049 (Sep., 1992).
R. E. Jones et al., Appl. Phys. Lett. 60(8), pp. 1022-1024 (Feb. 24, 1992).

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