Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1995-02-27
1997-11-11
Wojciechowicz, Edward
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257315, 257321, 257410, 257411, 257764, 257770, 257649, 437236, 437237, 437913, 437919, 437983, H01L 27108, H01L 2102
Patent
active
056867484
ABSTRACT:
An embodiment of the present invention describes a method for forming a dielectric material for a storage capacitor during fabrication of a semiconductor memory device, by: cleaning impurities from the surface of a conductive plate of the storage capacitor; forming a nitride film over the conductive plate's cleaned surface; forming a metal silicide film over the nitride film; and oxidizing the metal silicide film by rapid thermal oxide (RTO) processing. A resulting structure is a capacitor having a dielectric material that is an oxidized metal silicide film.
REFERENCES:
patent: 4690730 (1987-09-01), Tang et al.
patent: 4949162 (1990-08-01), Tamaki et al.
Sandhu Gurtej S.
Thakur Randhir P.S.
Micro)n Technology, Inc.
Wojciechowicz Edward
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