Dielectric-layer-coated substrate and installation for...

Details Dielectric-layer-coated substrate and installation for... Dielectric-layer-coated substrate and installation for...

2004-06-28

2010-10-26

McDonald, Rodney G (Department: 1795)

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

C204S192230, C204S192160

Reexamination Certificate

active

07820017

ABSTRACT:
The invention relates to a substrate (1), especially a glass substrate, coated with at least one dielectric thin-film layer deposited by sputtering, especially magnetically enhanced sputtering and preferably reactive sputtering in the presence of oxygen and/or nitrogen, with exposure to at least one ion beam (3) coming from an ion source (4), characterized in that said dielectric layer exposed to the ion beam has a refractive index that can be adjusted according to the parameters of the ion source, said ion source being a linear source.

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