Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1994-06-29
1996-11-19
Chu, John S. Y.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430160, 430175, 430176, 430302, 101456, 101457, 101462, G03C 193, G03C 177, G03F 7021
Patent
active
055761364
ABSTRACT:
According to the present invention the storage stability of a diazo based imaging element can be improved by controlling the amount of free water in the imaging element. Thus the present invention provides an imaging element comprising on a support a hydrophilic layer containing a hydrophilic (co)polymer or (co)polymer mixture and having been hardened with a hydrolyzed tetraalkyl orthosilicate and a light sensitive layer containing a diazo resin or a diazonium salt characterized in that the total amount of free water in said imaging element satisfies the following formula (I):
REFERENCES:
patent: 3971660 (1976-07-01), Staehle
patent: 4284705 (1981-08-01), Phlipot et al.
patent: 4552827 (1985-11-01), Eklund et al.
patent: 5202218 (1993-04-01), Yoshida et al.
patent: 5403694 (1995-04-01), Vermeersch et al.
Hauquier Guido
Vermeersch Joan
Verschueren Eric
Agfa-Gevaert N.V.
Chu John S. Y.
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