Diaphragm valve with reliability enhancements for atomic...

Fluid handling – With heating or cooling of the system – With electric heating element

Reexamination Certificate

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Details

C251S331000

Reexamination Certificate

active

07021330

ABSTRACT:
A shut-off type diaphragm valve adapted for use in an atomic layer deposition system includes a valve seat having an annular seating surface that surrounds an inlet of the valve and extends radially therefrom. The seating surface contacts a substantial portion of the first side of a flexible diaphragm when the diaphragm is closed, to facilitate heat transfer and counteract dissipative cooling of the diaphragm, thereby inhibiting condensation of a medium flowing through the valve passage. The seating surface is preferably flat and smooth, to prevent shearing of an elastomeric diaphragm. For a plastic diaphragm, a ring-shaped seating ridge may extend from the seating surface to cause localized permanent deformation of the diaphragm and enhanced sealing, while still allowing a substantial portion of the diaphragm to contact the seating surface for enhanced heat transfer. Valve speed enhancements and other reliability enhancing features are also described.

REFERENCES:
patent: 3606241 (1971-09-01), Bornholdt
patent: 4273028 (1981-06-01), Turnwald et al.
patent: 4437488 (1984-03-01), Taggart et al.
patent: 4513945 (1985-04-01), Otsuki et al.
patent: 4582294 (1986-04-01), Fargo
patent: 4826132 (1989-05-01), Moldenhauer
patent: 4903938 (1990-02-01), Nishizawa et al.
patent: 4944487 (1990-07-01), Holtermann
patent: 5112027 (1992-05-01), Hanyu et al.
patent: 5188337 (1993-02-01), Mertens et al.
patent: 5282604 (1994-02-01), Wade
patent: 5326078 (1994-07-01), Kimura
patent: 5375738 (1994-12-01), Walsh et al.
patent: 5383646 (1995-01-01), Weingarten
patent: 5386849 (1995-02-01), Gilchrist et al.
patent: 5413311 (1995-05-01), Arstein et al.
patent: 5520001 (1996-05-01), Miyamoto et al.
patent: 5624102 (1997-04-01), Nishimura et al.
patent: 5669596 (1997-09-01), Yoshikawa et al.
patent: 5743513 (1998-04-01), Yoshikawa et al.
patent: 5755428 (1998-05-01), Ollivier
patent: 5820105 (1998-10-01), Yamaji et al.
patent: 5865421 (1999-02-01), Ono
patent: 5881997 (1999-03-01), Ogawa et al.
patent: 6007046 (1999-12-01), Rothermel
patent: 6073648 (2000-06-01), Watson et al.
patent: 6092550 (2000-07-01), Gotch et al.
patent: 6116267 (2000-09-01), Suzuki et al.
patent: 6179925 (2001-01-01), Schmitt et al.
patent: 6202672 (2001-03-01), Ellis et al.
patent: 6241213 (2001-06-01), Butler
patent: 6394415 (2002-05-01), Ohmi et al.
patent: 6508453 (2003-01-01), Mamyo
patent: 6585823 (2003-07-01), Van Wijck
patent: 6659421 (2003-12-01), Goossens
patent: 6752387 (2004-06-01), Nishizato et al.
patent: 2003/0121608 (2003-07-01), Chen et al.
Detroit Coil Co., “What is a Solenoid?”, http://www.detroitcoil.com/whatis.htm, visited May 19, 2003, 10 pages.
Fujikin, Inc., Straight Diaphragm Valves specification sheet, http://www.fujikin.com.jp/topics/topics2—e.htm, visited May 20, 2003, 3 pages.
Fujikin, Inc., Mega-One LA Direct Diaphragm Valve with Pneumatic Cylinder, http://www.fujikin.co.jp/prodinf/en/pure/mega/la.html, visited May 20, 2003, 5 pages.

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