Fluid handling – With heating or cooling of the system – With electric heating element
Reexamination Certificate
2007-03-20
2007-03-20
Lee, Kevin (Department: 3753)
Fluid handling
With heating or cooling of the system
With electric heating element
C251S331000
Reexamination Certificate
active
11278482
ABSTRACT:
A shut-off type diaphragm valve adapted for use in an atomic layer deposition system includes a flexible diaphragm operable to flex between an open position whereby a valve passage is at least partially open and a closed position whereby a substantial portion of a first side of the diaphragm is pressed against a valve seat to thereby block the valve passage and facilitate heat transfer between the valve seat and the diaphragm. In some embodiments, a heating body thermally contacts the valve body and extends proximal to a second side of the diaphragm opposite the first side thereof to form a thermally conductive pathway that facilitates maintaining an operating temperature at the diaphragm. A thermally resistive member may be interposed between the valve passage and an actuator, such as a solenoid, for attenuating heat transfer between the valve passage and the actuator.
REFERENCES:
patent: 3606241 (1971-09-01), Bornholdt
patent: 4273028 (1981-06-01), Turnwald et al.
patent: 4437488 (1984-03-01), Taggart et al.
patent: 4513945 (1985-04-01), Otsuki et al.
patent: 4582294 (1986-04-01), Fargo
patent: 4826132 (1989-05-01), Moldenhauer
patent: 4903938 (1990-02-01), Nishizawa et al.
patent: 4944487 (1990-07-01), Holtermann
patent: 5112027 (1992-05-01), Hanyu et al.
patent: 5188337 (1993-02-01), Mertens et al.
patent: 5282604 (1994-02-01), Wade
patent: 5326078 (1994-07-01), Kimura
patent: 5375738 (1994-12-01), Walsh et al.
patent: 5383646 (1995-01-01), Weingarten
patent: 5386849 (1995-02-01), Gilchrist et al.
patent: 5413311 (1995-05-01), Arstein et al.
patent: 5520001 (1996-05-01), Miyamoto et al.
patent: 5624102 (1997-04-01), Nishimura et al.
patent: 5669596 (1997-09-01), Yoshikawa et al.
patent: 5743513 (1998-04-01), Yoshikawa et al.
patent: 5755428 (1998-05-01), Ollivier
patent: 5820105 (1998-10-01), Yamaji et al.
patent: 5865421 (1999-02-01), Ono
patent: 5881997 (1999-03-01), Ogawa et al.
patent: 6007046 (1999-12-01), Rothermel
patent: 6073648 (2000-06-01), Watson et al.
patent: 6092550 (2000-07-01), Gotch et al.
patent: 6116267 (2000-09-01), Suzuki et al.
patent: 6179925 (2001-01-01), Schmitt et al.
patent: 6202672 (2001-03-01), Ellis et al.
patent: 6241213 (2001-06-01), Butler
patent: 6394415 (2002-05-01), Ohmi et al.
patent: 6508453 (2003-01-01), Mamyo
patent: 6585823 (2003-07-01), Van Wijck
patent: 6659421 (2003-12-01), Goossens
patent: 6752387 (2004-06-01), Nishizato et al.
patent: 6907897 (2005-06-01), Maula et al.
patent: 6941963 (2005-09-01), Maula et al.
patent: 7021330 (2006-04-01), Maula et al.
patent: 2003/0121608 (2003-07-01), Chen et al.
patent: 2004/0261850 (2004-12-01), Maula et al.
patent: 2004/0262562 (2004-12-01), Maula et al.
patent: 2005/0011555 (2005-01-01), Maula et al.
Detroit Coil Co., “What Is A Solenoid?”, http://www.detroitcoil.com/whatis.htm, visited May 19, 2003, 10 pages.
Fujikin, Inc., Straight Diaphragm Valve specification sheet, http://www.fujikin.com.jp/topics2—e.htm, visited May 20, 2003, 3 pages.
Fujikin, Inc., MEGA-ONE LA Direct Diaphragm Valve with Pneumatic Cylinder, http://www.fujikin.com.jp/prodinf/en/pure/mega/la.html, visited May 20, 2003, 5 pages.
Aitchison Bradley J.
Härkönen Kari
Kuosmanen Pekka
Lang Teemu
Leskinen Hannu
Lee Kevin
Planar Systems Inc.
Stoel Rives LLP
LandOfFree
Diaphragm valve for atomic layer deposition does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Diaphragm valve for atomic layer deposition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Diaphragm valve for atomic layer deposition will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3734668