Diaphragm for an integrator unit

Photocopying – Projection printing and copying cameras – Illumination systems or details

Reexamination Certificate

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Details

C355S053000, C355S067000

Reexamination Certificate

active

06885434

ABSTRACT:
The invention relates to a diaphragm (1) for an integrator unit of a microlithographic projection exposure system. The diaphragm (1) includes a diaphragm opening (3), which is symmetrical with respect to a first axis of symmetry (5). The widths of the diaphragm aperture (3) in the direction of the axis of symmetry (5) are dependent on the distance (y) from the first axis of symmetry (5). The widths are greater than or equal to the width at y=0. The diaphragm (1), together with a cylindrical integrator, forms an integrator unit, which is located in an illumination system.

REFERENCES:
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patent: 5601733 (1997-02-01), Partlo
patent: 5675401 (1997-10-01), Wangler et al.
patent: 5982558 (1999-11-01), Fürter et al.
patent: 6349005 (2002-02-01), Schuster et al.
patent: 6366410 (2002-04-01), Schultz et al.
patent: 6377336 (2002-04-01), Shiraishi et al.
patent: 6522484 (2003-02-01), Schuster
patent: 20020149855 (2002-10-01), Schuster
patent: 20020196419 (2002-12-01), Mizouchi
patent: 20030007253 (2003-01-01), Schuster et al.
patent: 0633506 (1994-06-01), None
patent: 1154330 (2001-05-01), None
patent: 11260716 (1999-09-01), None
patent: 2000243681 (2000-09-01), None
“Diaphragm at quartz-rod entrance for I-line scanners”, Research Disclosure, Kenneth Mason Publications, Hampshire, Great Britain, Jul. 1999, p. 939.

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