Diamond thin film coating method and diamond-coated cemented...

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma

Reexamination Certificate

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C427S249100, C427S249800, C427S249130, C427S249150, C427S255110, C427S255180, C427S255260, C427S255270

Reexamination Certificate

active

07879412

ABSTRACT:
A diamond thin film coating method is provided that enables, with no need for an intermediate layer, the formation of a diamond thin film, which has conventionally been considered difficult because cobalt contained in a binding phase of a cemented carbide provides a catalysis for the formation of graphite.Cobalt in a binding phase (11) present in a surface of a cemented carbide substrate member comprised of a hard phase of a carbide (2) and a binding phase (1) containing cobalt, is silicidated into silicide (3), and thereafter the diamond thin film is formed.

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Dowling et al “Comparison between acid leaching and siliciding pre-treatments on erosive wear performance of diamond coatings on cemented carbide substrates” Thin Solid Films 377-378 (2000) 239-242.
Kubelka et al., “Influences of WC-Co Hard Metal Substrate Pre-Treatments with Boron and Silicon . . . ,” Diamond & Related Materials, vol. 3, pp. 1360-1369, 1994.

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