Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Reexamination Certificate
2011-02-01
2011-02-01
Turner, Archene (Department: 1784)
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
C427S249100, C427S249800, C427S249130, C427S249150, C427S255110, C427S255180, C427S255260, C427S255270
Reexamination Certificate
active
07879412
ABSTRACT:
A diamond thin film coating method is provided that enables, with no need for an intermediate layer, the formation of a diamond thin film, which has conventionally been considered difficult because cobalt contained in a binding phase of a cemented carbide provides a catalysis for the formation of graphite.Cobalt in a binding phase (11) present in a surface of a cemented carbide substrate member comprised of a hard phase of a carbide (2) and a binding phase (1) containing cobalt, is silicidated into silicide (3), and thereafter the diamond thin film is formed.
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Campus Create Co., Ltd.
NDQ&M Watchstone LLP
The University of Electro-Communications
Turner Archene
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