Diamond membranes for X-ray lithography

Details Diamond membranes for X-ray lithography Diamond membranes for X-ray lithography

1991-06-25

1992-09-08

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

156DIG68, 423446, 427249, G21K 500, B01J 306

Patent

active

051464810

ABSTRACT:
A substantially compressive stress-free, pin-holes free, and defects free continuous polycrystalline diamond membrane for an x-ray lithography mask is produced by placing a prepared substrate into a hot filament chemical vapor deposition reaction chamber, pre-heating the substrate to 400.degree. C.-650.degree. C. in the presence of an inert gas, heating the substrate to 650.degree. C.-700.degree. C. in the presence of hydrogen and carbon compounds, and chemically vapor depositing a polycrystalline diamond membrane onto the substrate.

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