Diamond film deposition with a microwave plasma

Details Diamond film deposition with a microwave plasma Diamond film deposition with a microwave plasma

1993-07-20

1994-12-06

Pianalto, Bernard

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427294, 427299, 427314, 427577, 427595, B05D 306

Patent

active

053709128

ABSTRACT:
A method for depositing diamond film on a substrate utilizing a tuneable microwave cavity with an adjustable height and antenna and an electrically insulated chamber comprises the steps of decreasing the pressure within the chamber, creating a plasma including hydrogen gas within the chamber, tuning the cavity by varying its height and the depth of insertion of the antenna to minimize reflected power and properly position the plasma on the substrate, injecting a hydrocarbon gas into the chamber, and maintaining the plasma for a sufficient time for diamond film of the desired thickness to be deposited.

REFERENCES:
patent: 4434188 (1984-02-01), Kamo et al.
patent: 4507588 (1985-03-01), Asmussen et al.
patent: 4585668 (1986-04-01), Asmussen et al.
patent: 4591662 (1986-05-01), Legros et al.
patent: 4630566 (1986-12-01), Asmussen et al.
Experimental Aspects Of The Microwave Activated Plasma CVD of Diamond Films At MRL, P. K. Bachmann, The Diamond and Related Materials Consortium Newsletter, 1, Jun. 1987.

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