Diamond crystal forming method

Details Diamond crystal forming method Diamond crystal forming method

1995-10-10

1997-03-04

Breneman, R. Bruce

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419216, 20419212, 423446, 117108, 117929, C23C 1434, C01B 3106, C30B 2904

Patent

active

056075600

ABSTRACT:
A diamond crystal forming method with which a diamond crystal is formed on a substrate by a sputtering process uses high-frequency energy in the frequency range of 40 MHz to 250 MHz to form plasma.

REFERENCES:
patent: 4597844 (1986-07-01), Hiraki et al.
patent: 4767517 (1988-08-01), Hiraki et al.
patent: 4824546 (1989-04-01), Ohmi
patent: 5073241 (1991-12-01), Watanabe

Affiliated with

Also associated with

Rating

Diamond crystal forming method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Diamond crystal forming method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Diamond crystal forming method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2143686