Device manufacturing method, mask set for use in the method,...

Details Device manufacturing method, mask set for use in the method,... Device manufacturing method, mask set for use in the method,...

2008-01-08

2008-01-08

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S394000

Reexamination Certificate

active

10814802

ABSTRACT:
Isolated dark features, e.g. contact holes or lines, are exposed in a double exposure, using different illumination settings in the two exposures.

REFERENCES:
patent: 5045419 (1991-09-01), Okumura
patent: 5532090 (1996-07-01), Borodovsky
patent: 5686223 (1997-11-01), Cleeves
patent: 6528238 (2003-03-01), Seniuk et al.
patent: 6534242 (2003-03-01), Sugita et al.
patent: 6875545 (2005-04-01), Eurlings et al.
patent: 6934007 (2005-08-01), Fritze et al.
patent: 2002/0100012 (2002-07-01), Sutani et al.
patent: 2002/0195539 (2002-12-01), Nakao et al.
patent: 2003/0054263 (2003-03-01), Kanaya

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