Device having brush for scrubbing substrate

Brushing – scrubbing – and general cleaning – Machines – With air blast or suction

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Details

15 883, 153092, 15319, 134153, 134902, B08B 302

Patent

active

053752910

ABSTRACT:
A substrate cleaning device comprising a motor for rotating a wafer together with a spin plate, claws for holding the wafer so as to form a space between the spin plate and the wafer, a jet nozzle through which cleaning solution is jetted onto an upper surface of the wafer, a rotating brush for brush-cleaning the upper surface of the wafer, a mechanism for blowing nitrogen gas or pure water onto the lower surface of the wafer, and a mechanism for exhausting the space between the spin plate and the wafer, wherein a solution passage for the solution blowing mechanism and an exhaust passage for the exhaust mechanism are formed in a drive shaft of the motor and communicated with the space.

REFERENCES:
patent: 4544446 (1985-10-01), Cady
patent: 4750505 (1988-06-01), Inuta et al.
patent: 4788994 (1988-12-01), Shinbara
patent: 4871417 (1989-10-01), Nishizawa et al.
patent: 5169408 (1992-12-01), Biggerstaff et al.
patent: 5209180 (1993-05-01), Shoda et al.

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