X-ray or gamma ray systems or devices – Specific application – Lithography
Reexamination Certificate
2005-03-08
2005-03-08
Bruce, David V. (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Lithography
C378S064000, C378S084000, C378S147000, C378S149000
Reexamination Certificate
active
06865251
ABSTRACT:
A lithography device including a soft X-ray source1transforming to a quasi-parallel radiation apparatus for placing a mask3and a plate-substrate4coated with a resist5, and an absorbing filter6for smoothing of intensity decreasing as from the center to the periphery of a beam. The filter6is placed between the source1and the input face of the half-lens2. The half-lens has an enlarged capture angle. This angle is chosen depending on radiation energy (0.6-6 keV) of the source1. As a result, there is an opportunity to increase the size of the plate-substrate.
REFERENCES:
patent: 4969169 (1990-11-01), Forsyth
patent: 5175755 (1992-12-01), Kumakhov
patent: 5497008 (1996-03-01), Kumakhov
patent: 5570408 (1996-10-01), Gibson
patent: 5745547 (1998-04-01), Xiao
patent: 5768339 (1998-06-01), O'Hara
patent: 5812631 (1998-09-01), Yan et al.
patent: 6271534 (2001-08-01), Kumakhov
patent: 2109358 (1998-04-01), None
patent: 2122757 (1998-11-01), None
patent: 1639313 (1998-04-01), None
English translation of SU 1639313 Abstract.
English translation of RU 2109358 Abstract.
English translation of RU 2122757 Abstract.
Bruce David V.
Ho Allen C.
Holt William H.
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