Device for use in photochemical and photomechanical processes

Details Device for use in photochemical and photomechanical processes Device for use in photochemical and photomechanical processes

1979-05-25

1981-05-19

Kimlin, Edward C.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

101456, 20415914, 430280, 430300, 430310, 430302, 430313, 430323, 430325, G03C 168, G03C 500

Patent

active

042686083

ABSTRACT:
A photoreactive composition containing an effective amount of a polymer which includes as a recurring structure: ##STR1## wherein Ar is a bivalent aromatic radical, and M is selected from the class consisting of hydrogen, alkali metal, ammonium, and substituted ammonium. These compositions are useful in a wide variety of photochemical and photomechanical processes and are particularly suited for use as photopolymers, photoinitiators and photosensitizers in light sensitive coatings of presensitized lithographic plates.

REFERENCES:
patent: 3888671 (1975-06-01), Muzyczko et al.
patent: 3969119 (1976-07-01), Muzyczko et al.
patent: 4065314 (1977-12-01), Muzyczko et al.
patent: 4156612 (1979-05-01), Muzyczko et al.

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