Device for the insolation of micrometric and/or submicrometric a

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

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430327, 430331, 313309, G03C 500

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active

057006270

ABSTRACT:
A device for insolating micrometric areas in a photosensitive layer and a method for producing patterns in such a layer.
The method is characterized in that the layer is subjected to an atmosphere containing a transparent liquid that does not wet the photosensitive material, in order to produce on this layer a monolayer of micro-droplets (121), the layer of photosensitive material is insolated through the monolayer of micro-droplets (121) in order to selectively print the areas of exposure (122) of the layer, the micro-droplets (121) are removed, and the layer of photosensitive material is developed in order to form said patterns in accordance with the areas of exposure.

REFERENCES:
patent: 4857161 (1989-08-01), Borel et al.
Patent Abstracts of Japan, No. JP 57181549, vol. 7, No. 030 (P-173), Feb. 5, 1983.
Patent Abstracts of Japan, No. JP 58004148, vol. 7, No. 075 (P-187), Mar. 29, 1983.
La pulverisation par ultra-sons appliquee a la spectrometrie d'absorption atomique, by J. Spitz and G. Uny, Applied Optics, vol. 7, No. 7, Jul. 1968.
Chemical Vapor Deposition at Low Temperatures, by J. C. Viguie and J. Spitz, vol. 122, No. 4, Apr. 1975, pp. 585-588.
Chemical Abstract 1997: 175,368 no month available.
Chemical Abstract 1996: 302,465 no month available.

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