Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1996-08-14
1997-12-23
Gorgos, Kathryn L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430327, 430331, 313309, G03C 500
Patent
active
057006270
ABSTRACT:
A device for insolating micrometric areas in a photosensitive layer and a method for producing patterns in such a layer.
The method is characterized in that the layer is subjected to an atmosphere containing a transparent liquid that does not wet the photosensitive material, in order to produce on this layer a monolayer of micro-droplets (121), the layer of photosensitive material is insolated through the monolayer of micro-droplets (121) in order to selectively print the areas of exposure (122) of the layer, the micro-droplets (121) are removed, and the layer of photosensitive material is developed in order to form said patterns in accordance with the areas of exposure.
REFERENCES:
patent: 4857161 (1989-08-01), Borel et al.
Patent Abstracts of Japan, No. JP 57181549, vol. 7, No. 030 (P-173), Feb. 5, 1983.
Patent Abstracts of Japan, No. JP 58004148, vol. 7, No. 075 (P-187), Mar. 29, 1983.
La pulverisation par ultra-sons appliquee a la spectrometrie d'absorption atomique, by J. Spitz and G. Uny, Applied Optics, vol. 7, No. 7, Jul. 1968.
Chemical Vapor Deposition at Low Temperatures, by J. C. Viguie and J. Spitz, vol. 122, No. 4, Apr. 1975, pp. 585-588.
Chemical Abstract 1997: 175,368 no month available.
Chemical Abstract 1996: 302,465 no month available.
Baptist Robert
Ida Michel
Commissariat a l''Energie Atomique
Gorgos Kathryn L.
Mayekar Kishor
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